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Physics Colloquium with Dr. Christophe Vallée
From Atomic Layer Deposition to Area Selective Deposition with Dr. Christophe Vallée University at Albany ABSTRACT: The manufacture of nanoscale devices by the SC industry requires regular innovations in the shaping processes used to deposit and etch nanoscale layers. The SC industry is thus moving from the use of conventional “continuous” plasma processes such as Plasma Enhanced Chemical Vapor Deposition (PECVD) and Reactive Ion Etching (RIE) to the use of “cyclic” or “pulsed” plasma...
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