BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//Burlington Bash//Events//EN
CALSCALE:GREGORIAN
BEGIN:VEVENT
UID:event-dd94a6f11a7de1ca@burlingtonbash.com
DTSTAMP:20261008T170459Z
DTSTART:20261012T181000Z
DTEND:20261012T191000Z
SUMMARY:Physics Colloquium with Dr. Christophe Vallée
LOCATION:Innovation Hall\, 82 University Place\, Burlington\, VT 05405
DESCRIPTION:From Atomic Layer Deposition to Area Selective Deposition with 
 Dr. Christophe Vallée University at Albany ABSTRACT: The manufacture of n
 anoscale devices by the SC industry requires regular innovations in the sh
 aping processes used to deposit and etch nanoscale layers. The SC industry
  is thus moving from the use of conventional “continuous” plasma proce
 sses such as Plasma Enhanced Chemical Vapor Deposition (PECVD) and Reactiv
 e Ion Etching (RIE) to the use of “cyclic” or “pulsed” plasma...
URL:https://events.uvm.edu/event/physics-colloquium-with-dr-christophe-vall
 ee
END:VEVENT
END:VCALENDAR
